PVD Coating and PVD Materials
Brief Introduction of Physical Vapour Deposition (PVD)? Physical vapour deposition (PVD) is a thin-film coating process which produces coatings of pure metals, metallic alloys and ceramics with a thickness usually in the range 1 to 10µm. Physical vapour deposition, as its name implies, involves physically depositing atoms, ions or molecules of a coating species on to a substrate. There are three main types of PVD, all of which are undertaken in a chamber containing a controlled atmosphere at reduced pressure (0.1 to 1 N/m 2). All three techniques can be used for the direct deposition of a material or for 'reactive' use in which chemical reaction occurs in the vapour/plasma phase between atoms of the coating material and 'reactive' gases. 1. Thermal evaporation. Thermal evaporation uses the heating of a material to form a vapour which condenses on a substrate to form the coating. Heating is achieved by various methods including hot filament, electrical resistance...