Silver sputtering targets and ITO sputtering targets
A customer from Germany, they ordered 12 pieces sputtering target for 10 pieces sliver sputtering taregts and 2 pieces ITO sputtering taregts. The purity is for 99.99%. If you have any needs in sputtering targets and evaporation materials, please feel free to contact us.
Silver Sputtering Targets (Ag)
Silver is a soft, lustrous element that belongs to the transition group of metals on the periodic table. It has a melting point of 962 ℃, a density of 10.5 g/cc, and vapor pressure of 10-4 Torr at 1,105 ℃. Silver has been used since ancient times in countless products. It is ductile, malleable, and the most electrically conductive of all metals. It is considered a precious metal and can be found in jewelry, solders, paints, and mirrors. It is evaporated under vacuum for the production of semiconductors, sensors, fuel cells, and optical coatings. Silver is the metallic element with the atomic number 47. Its symbol is Ag, from the Latin argentum, derived from the Greek (literally "shiny" or "white"), and ultimately from a Proto-Indo-European language root reconstructed as *h2er, "grey" or "shining". A soft, white, lustrous transition metal, it exhibits the highest electrical conductivity, thermal conductivity, and reflectivity of any metal. The metal is found in the Earth's crust in the pure, free elemental form ("native silver"), as an alloy with gold and other metals, and in minerals such as argentite and chlorargyrite. Most silver is produced as a byproduct of copper, gold, lead, and zinc refini.
Material Notes
Silver Sputtering Targets, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Options
• 99.999% minimum purity
• Semiconductor grade aluminum alloys available
Al/Si,Al/Cu,Al/Cu/Si
• Planar circular targets up to 18'' (457mm) diameter
• Planar tiles up to 48'' (1200mm) X 15.75'' (400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
• 99.999% minimum purity
• Semiconductor grade aluminum alloys available
Al/Si,Al/Cu,Al/Cu/Si
• Planar circular targets up to 18'' (457mm) diameter
• Planar tiles up to 48'' (1200mm) X 15.75'' (400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
Indium Tin Oxide Sputtering Targets (ITO)
Indium tin oxide (ITO, In2O3/SnO2 90/10 WT%) is a ternary composition of indium, tin and oxygen in varying proportions. Depending on the oxygen content, it can either be described as a ceramic or alloy. Indium tin oxide is typically encountered as an oxygen-saturated composition with a formulation of 74% In, 18% O2, and 8% Sn by weight. Oxygen-saturated compositions are so typical, that unsaturated compositions are termed oxygen-deficient ITO. It is transparent and colorless in thin layers, while in bulk form it is yellowish to grey. ITO is among one of the most heavily utilized compounds in the thin film industry due to its electrical conductivity and optical transparency. It is evaporated or sputtered under vacuum to generate transparent conductive layers in the manufacture of LCDs and various optical coatings. Thin films of ITO are created for the development of sensors, as well as, a glass coating for the automotive industry.
Indium Tin Oxide (ITO) sputtering target is widely used in the formation of electrically transparent thin films, which adopt direct current magnetron sputtering process for electrodes in flat panel displays, solar cells, gas sensors and so on. In order to improve ITO thin film property, ITO sputtering target requires high purity, homogeneous microstructure, high density and high electrical conductivity. ITO sputtering targets were fabricated using In2O3-SnO2 mixed powders and tin doped indium oxide powders.
Material Notes of ITO Sputtering Targets
Purity: 99.99%
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Types: Planar sputtering targets, Rotary sputtering targets
Target Bonding Service is recommended for these ITO targets. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.
This ITO sputtering target may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Types: Planar sputtering targets, Rotary sputtering targets
Target Bonding Service is recommended for these ITO targets. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.
This ITO sputtering target may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.
Options
• 99.9% Minimum Purity
• 99.9% Minimum Purity
• Planar, rotary, Slug avaliable
• Variety composition such as 90/10,93/7,95/5,97/3,98/2 etc.
Advanced Engineering Materials Limited (AEM) is an international company involved in the R & D, manufacturing and sales of all kinds of high-tech materials. We provide worldwide research institutes and high-tech enterprises with high purity non-ferrous materials, customized alloys, compounds and almost every kind of complicated synthetic material, etc. We have great advantages in magnetron sputtering targets, vacuum coating materials, high-purity metals, high-purity compounds, rare-earth metals, distilled rare-earth metals, coated substrates, etc..





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